The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Mar. 01, 2022
Applicant:
Ii-vi Delaware, Inc., Wilmington, DE (US);
Inventors:
Assignee:
II-VI Delaware, Inc., Wilmington, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 5/183 (2006.01); H01S 5/30 (2006.01); H01S 5/20 (2006.01);
U.S. Cl.
CPC ...
H01S 5/18327 (2013.01); H01S 5/1835 (2013.01); H01S 5/18311 (2013.01); H01S 5/18313 (2013.01); H01S 5/18347 (2013.01); H01S 5/18361 (2013.01); H01S 5/2081 (2013.01); H01S 5/3013 (2013.01);
Abstract
A corrected mesa structure for a VCSEL device is particularly configured to compensate for variations in the shape of the created oxide aperture that result from anisotropic oxidation. In particular, a corrected mesa shape is derived by determining the shape of an as-created aperture formed by oxidizing a circular mesa structure, and then ascertaining the compensation required to convert the as-created shape into a desired ('target') shaped aperture opening. The compensation value is then used to modify the shape of the mesa itself such that a following anisotropic oxidation yields a target-shaped oxide aperture.