The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2023

Filed:

Mar. 05, 2021
Applicants:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Toshiba Electronic Devices & Storage Corporation, Tokyo, JP;

Inventor:

Hiroshi Kono, Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/482 (2006.01); H01L 29/78 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 23/4824 (2013.01); H01L 23/4827 (2013.01); H01L 29/1608 (2013.01); H01L 29/7802 (2013.01);
Abstract

According to an embodiment, provided is a semiconductor device includes a semiconductor layer; a first electrode; a second electrode; an electrode pad; a wiring layer electrically connected to the gate electrode; a first polycrystalline silicon layer electrically connected to the electrode pad and the wiring layer; and an insulating layer provided between the first polycrystalline silicon layer and the electrode pad and between the first polycrystalline silicon layer and the wiring layer and having a first opening and a second opening. The electrode pad and the first polycrystalline silicon layer are electrically connected via an inside of the first opening. The wiring layer and the first polycrystalline silicon layer are electrically connected via an inside of the second opening, A first opening area of the first opening is larger than a second opening area of the second opening.


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