The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2023

Filed:

Apr. 23, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Takashi Dobashi, Tokyo, JP;

Hirokazu Tamaki, Tokyo, JP;

Kuniyasu Nakamura, Tokyo, JP;

Hiromi Mise, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/20 (2006.01); H01J 37/244 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/20 (2013.01); H01J 37/244 (2013.01); H01J 37/265 (2013.01); H01J 2237/2802 (2013.01);
Abstract

A charged particle beam apparatus includes: a movement mechanism; a particle source; an optical element; a detector; and a control mechanism, in which the control mechanism acquires a diffraction pattern including a plurality of Kikuchi lines, calculates a crystal zone axis of the sample by performing analysis based on a plurality of intersections at which two Kikuchi lines included in the diffraction pattern intersect with each other, calculates an inclination angle of the sample based on the crystal zone axis and an irradiation direction of the charged particle beam, and controls the moving mechanism based on the inclination angle.


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