The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2023

Filed:

Oct. 19, 2020
Applicant:

Aspentech Corporation, Bedford, MA (US);

Inventors:

Hong Zhao, Sugar Land, TX (US);

Qingsheng Quinn Zheng, Sugar Land, TX (US);

Kerry Clayton Ridley, Houston, TX (US);

Liangfeng Lao, Houston, TX (US);

Yizhou Fang, Katy, TX (US);

Assignee:

AspenTech Corporation, Bedford, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/4155 (2006.01); G06N 3/08 (2023.01); G06N 5/02 (2023.01);
U.S. Cl.
CPC ...
G05B 19/4155 (2013.01); G06N 3/08 (2013.01); G06N 5/02 (2013.01); G05B 2219/42033 (2013.01);
Abstract

Systems and methods provide a new paradigm of Advanced Process Control that includes building and deploying APC seed models. Embodiments provide automated data cleansing and selection in model identification and adaption in multivariable process control (MPC) techniques. Rather than plant pre-testing onsite for building APC seed models, the embodiments help APC engineers to build APC seed models from existing plant historical data with self-learning automation and pattern recognition, AI techniques. Embodiments further provide 'growing' and 'calibrating' the APC seed models online with non-invasive closed loop step testing techniques. PID loops and associated SP, PV, and OPs are searched and identified. Only “informative moves” data is screened, identified, and selected among a long history of process variables for seed model development and MPC application. The seed models are efficiently developed while skipping the costly traditional pre-testing steps and minimizing the interferences to the subject production process.


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