The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Sep. 21, 2021
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Christopher Gonzalez, Shelburne, VT (US);
David Wolpert, Poughkeepsie, NY (US);
Michael Hemsley Wood, Wilmington, DE (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2020.01); G01R 31/28 (2006.01); G06F 30/3312 (2020.01); G06F 117/12 (2020.01); G06F 119/12 (2020.01);
U.S. Cl.
CPC ...
G01R 31/2623 (2013.01); G01R 31/2884 (2013.01); G06F 30/3312 (2020.01); G06F 2117/12 (2020.01); G06F 2119/12 (2020.01);
Abstract
A method is provided to increase processor frequency in an integrated circuit (IC). The method includes identifying a gate included in the IC, the gate having a gate threshold voltage and performing a plasma process to form an antenna signal path in signal communication with the gate. The method further comprises adjusting the plasma process or circuit design to increase plasma induced damage (PID) applied to the gate so as to alter the gate threshold voltage.