The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Nov. 10, 2017
Applicant:
The Regents of the University of Colorado, Denver, CO (US);
Inventors:
Alan W. Weimer, Niwot, CO (US);
Amanda Hoskins, Superior, CO (US);
Charles Musgrove, Longmont, CO (US);
Assignee:
The Regents of the University of Colorado, Denver, CO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); B81B 3/00 (2006.01); C04B 28/06 (2006.01); C04B 111/00 (2006.01); B32B 1/08 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45531 (2013.01); B81B 3/00 (2013.01); B81B 3/0075 (2013.01); C04B 28/06 (2013.01); C23C 16/401 (2013.01); C23C 16/402 (2013.01); C23C 16/403 (2013.01); C23C 16/4417 (2013.01); C23C 16/45555 (2013.01); B32B 1/08 (2013.01); C04B 2111/00551 (2013.01); C04B 2235/3231 (2013.01); Y10T 428/265 (2015.01);
Abstract
The present invention relates, in part, to a discovery of a method for using atomic layer deposition (ALD) to improve the stability of refractory materials in high temperature steam, and compositions produced by the method.