The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2023

Filed:

Jul. 20, 2021
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Glen Harold Kirby, Liberty Township, OH (US);

Jeffery Allen Bross, Liberty Township, OH (US);

Justin Michael Nagy, Newport, KY (US);

Alan David Gerken, Cincinnati, OH (US);

Guruvenket Srinivasan, Loveland, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); F01D 5/28 (2006.01); C23C 16/56 (2006.01); C04B 41/45 (2006.01); C23C 16/24 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); C04B 41/4531 (2013.01); C04B 41/4539 (2013.01); C04B 41/4572 (2013.01); C04B 41/4592 (2013.01); C23C 16/24 (2013.01); C23C 16/56 (2013.01); F01D 5/288 (2013.01); F05D 2230/314 (2013.01); F05D 2300/6033 (2013.01);
Abstract

A method for processing a component is provided and includes masking a first portion of the component with a maskant. The maskant includes a slurry having a plurality of particles in a fluid carrier. The plurality of particles comprises at least one of silicon, carbon, one or more rare earth disilicates, monosilicates or oxides, and combinations thereof. The method includes depositing a silicon-based coating on a second portion of the component via a chemical vapor deposition process and removing the maskant and any overlying silicon-based coating from the first portion of the component.


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