The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2023

Filed:

Nov. 20, 2018
Applicant:

Ppg Industries Ohio, Inc., Cleveland, OH (US);

Inventors:

Paul F. Cheetham, Wexford, PA (US);

Shawn R. DeBerry, Cranberry Township, PA (US);

Assignee:

PPG Industries Ohio, Inc., Cleveland, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 11/52 (2014.01); C09D 11/037 (2014.01); C23F 1/02 (2006.01); C23F 1/10 (2006.01); G06F 3/044 (2006.01); H05K 1/09 (2006.01); H05K 3/06 (2006.01); H01Q 1/38 (2006.01);
U.S. Cl.
CPC ...
C09D 11/52 (2013.01); C09D 11/037 (2013.01); C23F 1/02 (2013.01); C23F 1/10 (2013.01); G06F 3/044 (2013.01); H05K 1/09 (2013.01); H05K 3/067 (2013.01); G06F 2203/04102 (2013.01); G06F 2203/04103 (2013.01); G06F 2203/04112 (2013.01); H01Q 1/38 (2013.01); H05K 2201/0388 (2013.01); H05K 2203/0545 (2013.01);
Abstract

A patterning paste is disclosed for patterning metal nanowires, the patterning paste including a complexing agent containing guanidine thiocyanate. A method of selectively patterning a substrate having metal nanowires includes: providing a substrate having a surface bearing metal nanowires; and selectively applying the patterning paste to the substrate such that the metal nanowires are selectively cut into a pattern. A consumer electronic product includes: a substrate having a surface bearing metal nanowires. The metal nanowires of the substrate are selectively patterned by applying the patterning paste to the substrate such that the metal nanowires are selectively cut into the pattern.


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