The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Jan. 18, 2022
Applicant:
Industrial Technology Research Institute, Hsinchu, TW;
Inventors:
Chi-Fu Tseng, Taipei, TW;
Jauder Jeng, Zhudong Township, TW;
Tien-Shou Shieh, Hsinchu, TW;
Chin-Hui Chou, Zhudong Township, TW;
Assignee:
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 79/08 (2006.01); C08G 63/78 (2006.01);
U.S. Cl.
CPC ...
C08G 63/78 (2013.01); C08G 2115/00 (2021.01);
Abstract
An oligomer is formed by reacting a diacid monomer with (a) epoxy resin or (b) glycidyl methacrylate, wherein the diacid monomer has a chemical structure of wherein X is —O—, and each Ris independently CH, CHF, CHF, or CF. A composition containing the oligomer can be cured to serve as a sealant of an optoelectronic device, and the sealant can be lifted off by a laser beam irradiation.