The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Oct. 23, 2020
Applicant:
Korea Institute of Science and Technology, Seoul, KR;
Inventors:
Assignee:
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); B82B 3/00 (2006.01); B82B 1/00 (2006.01);
U.S. Cl.
CPC ...
B82B 3/0019 (2013.01); B82B 1/001 (2013.01); C03C 15/00 (2013.01); C03C 2218/33 (2013.01);
Abstract
The present invention relates to: a method of manufacturing glass with hollow nanopillars, which includes a silicon oxide layer forming step in which a silicon oxide layer made of silicon oxide is formed on one side of a glass substrate, a first etching step in which the silicon oxide layer is etched and a plurality of silicon oxide clusters are formed on the glass substrate, and a second etching step in which the glass substrate, on which the silicon oxide clusters are formed, is etched and hollow nanopillars are formed; and glass with hollow nanopillars manufactured thereby.