The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2023

Filed:

May. 03, 2022
Applicant:

Fisher & Paykel Healthcare Limited, Auckland, NZ;

Inventors:

Mark Arvind McLaren, Auckland, NZ;

Jeroen Hammer, Auckland, NZ;

Vitaly Kapelevich, Auckland, NZ;

Brett John Huddart, Auckland, NZ;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61M 16/06 (2006.01); A61M 16/08 (2006.01);
U.S. Cl.
CPC ...
A61M 16/0683 (2013.01); A61M 16/0616 (2014.02); A61M 16/0666 (2013.01); A61M 16/0816 (2013.01); A61M 2205/0216 (2013.01); A61M 2205/0244 (2013.01); A61M 2205/0283 (2013.01); A61M 2205/0294 (2013.01);
Abstract

A headgear for securing a mask to a user's face is described. The headgear requires a first load force to elongate the headgear and, when fitted to a user, applies a balanced fit force that substantially equals a load force applied to the headgear during respiratory therapy. In some embodiments, the headgear includes an elastic portion configured to provide a retraction force, a non-elastic portion configured to be inelastic in comparison to the elastic portion, and a restriction mechanism connected to the non-elastic portion and to the elastic portion. The restriction mechanism is configured to apply a first resistance force to the user's head on elongation of the headgear and a second resistance force to the user's head on retraction of the headgear.


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