The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Apr. 07, 2021
Sandisk Technologies Llc, Addison, TX (US);
Akihiro Tobioka, Yokkaichi, JP;
SANDISK TECHNOLOGIES LLC, Addison, TX (US);
Abstract
A vertically alternating sequence of unit layer stacks is formed over a substrate. Each unit layer stacks includes an insulating layer and a spacer material layer that is formed as, or is subsequently replaced with, a first electrically conductive layer. A 2×N array of stepped surfaces is formed. Each column of two stepped surfaces other than one column is vertically extended by performing a set of processing sequences at least once. The set of processing sequences includes forming a patterned etch mask layer and etching an unmasked subset of the 2×N array. One or more patterned etch mask layer has a respective continuous opening including an entire area of a respective 2×M array of stepped surfaces that is a subset of the 2×N array of stepped surfaces. Vertical stacks of memory elements are formed through the vertically alternating sequence.