The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2023

Filed:

Jul. 06, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Xuesong Lu, San Jose, CA (US);

Yu Lei, Belmont, CA (US);

Anup Phatak, Santa Clara, CA (US);

Hyman W. H. Lam, San Jose, CA (US);

Chong Jiang, Cupertino, CA (US);

Malcolm Emil Delaney, Los Gatos, CA (US);

Yufei Hu, Fremont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H05B 1/02 (2006.01); G06N 3/08 (2023.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); G06N 3/08 (2013.01); H05B 1/0233 (2013.01);
Abstract

A method includes receiving a plurality of sets of sensor data associated with a processing chamber of a substrate processing system. Each of the plurality of sets of sensor data comprises a corresponding sensor value of the processing chamber mapped to a corresponding spacing value of the processing chamber. The method further includes providing the plurality of sets of sensor data as input to a trained machine learning model. The method further includes obtaining, from the trained machine learning model, one or more outputs indicative of a health of the processing chamber. The method further includes causing, based on the one or more outputs, performance of one or more corrective actions associated with the processing chamber.


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