The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Oct. 10, 2019
Applicant:
Hitachi High-tech Corporation, Tokyo, JP;
Inventors:
Assignee:
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/16 (2006.01); H01J 49/04 (2006.01); G01N 30/72 (2006.01);
U.S. Cl.
CPC ...
H01J 49/167 (2013.01); G01N 30/7266 (2013.01); H01J 49/0445 (2013.01); H01J 49/0477 (2013.01);
Abstract
An object of the present invention is to improve the safety and stability of an ion source by making a temperature distribution of a heated gas uniform while ensuring heat insulating properties. The ion source according to the present invention includes a gas introduction port inside a probe holder that holds an ion probe. A heater that increases the temperature of a heated gas and the gas introduction port are connected by a plurality of pipes which extend along an extending direction of the ion probe and are independent of each other (see FIG.).