The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Jan. 08, 2021
Applicants:
Tsinghua University, Beijing, CN;
Hon Hai Precision Industry Co., Ltd., New Taipei, TW;
Inventors:
Mo Chen, Beijing, CN;
Qun-Qing Li, Beijing, CN;
Li-Hui Zhang, Beijing, CN;
Yuan-Hao Jin, Beijing, CN;
Dong An, Beijing, CN;
Shou-Shan Fan, Beijing, CN;
Assignees:
Tsinghua University, Beijing, CN;
HON HAI PRECISION INDUSTRY CO., LTD., New Taipei, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/48 (2012.01); G03F 7/30 (2006.01); G03F 1/50 (2012.01);
U.S. Cl.
CPC ...
G03F 7/20 (2013.01); G03F 1/48 (2013.01); G03F 1/50 (2013.01); G03F 7/2047 (2013.01); G03F 7/30 (2013.01);
Abstract
A method of making photolithography mask plate is provided. The method includes: providing a chrome layer on a substrate; depositing a carbon nanotube layer on the chrome layer to expose a part of a surface of the chrome layer; etching the chrome layer with the carbon nanotube layer as a mask to obtain a patterned chrome layer; and depositing a cover layer on the carbon nanotube layer.