The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Jan. 26, 2022
Applicant:
Northwestern University, Evanston, IL (US);
Inventors:
Chad A. Mirkin, Wilmette, IL (US);
Rustin Golnabi, Evanston, IL (US);
Eun Bi Oh, Evanston, IL (US);
David Alan Walker, Evanston, IL (US);
Assignee:
NORTHWESTERN UNIVERSITY, Evanston, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 33/38 (2006.01); C25D 5/02 (2006.01); C25D 17/00 (2006.01); C25D 17/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/38 (2013.01); C25D 5/02 (2013.01); C25D 17/00 (2013.01); C25D 17/12 (2013.01);
Abstract
Disclosed herein is a massively parallel patterning tool for the deposition of single metals or metal alloys with size and composition control. Methods of the disclosure use a hydrogel array of pyramidal pen tips as a medium for localized electrodeposition, in conjunction with a scanning probe lithography platform and a three-electrode cell. This versatile technique can be used for high-throughput 3D printing, biomolecule patterning, or screening of catalyst nanoparticles or thin films.