The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Nov. 05, 2018
Leica Microsystems Cms Gmbh, Wetzlar, DE;
Lars Friedrich, Mannheim, DE;
Holger Birk, Meckesheim, DE;
LEICA MICROSYSTEMS CMS GMBH, Wetzlar, DE;
Abstract
A method for scanning a sample includes generating at least two illumination points in order to form a point pattern, wherein the point pattern has a settable number of illumination points. At least one freely selectable parameter for defining the point pattern is preset or is set. At least one predefined region of the sample is scanned by moving the point pattern defined by the freely selectable parameter along a first direction such that scan lines assigned to the illumination points of the point pattern are generated, and along a second direction such that further scan lines are generated in each case following the scan lines. The movement of the point pattern in the second direction is carried out in scan steps of identical size or at a constant speed. The illumination points of the point pattern are arranged on a line along the second direction.