The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2023

Filed:

Jul. 14, 2020
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Kenichi Umeda, Kanagawa, JP;

Seigo Nakamura, Kanagawa, JP;

Tatsuya Yoshihiro, Kanagawa, JP;

Yuichiro Itai, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/115 (2015.01); G02B 1/116 (2015.01); G02B 5/28 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
G02B 1/115 (2013.01); G02B 1/116 (2013.01); G02B 5/285 (2013.01); G02F 1/133502 (2013.01); G02F 2201/38 (2013.01);
Abstract

The optical thin film is provided on a substrate and includes, in order, from the substrate side, an interlayer, a silver-containing metal layer, and a dielectric layer, in which an anchor region including an oxide of an anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the interlayer, a cap region including an oxide of the anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the dielectric layer, a film thickness of the silver-containing metal layer is 6 nm or less, the silver-containing metal layer contains a high standard electrode potential metal, and a peak position of a concentration distribution of the high standard electrode potential metal in a film thickness direction of the silver-containing metal layer is positioned closer to the interlayer than a peak position of a silver concentration distribution.


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