The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2023

Filed:

Dec. 20, 2018
Applicants:

Sick Ag, Waldkirch/Breisgau, DE;

Trumpf Werkzeugmaschinen Gmbh + Co. KG, Ditzingen, DE;

Inventors:

Jens Ottnad, Karlsruhe, DE;

Dennis Wolf, Rutesheim, DE;

Kevin Lutz, Boblingen, DE;

Christoph Blömker, Stuttgart, DE;

Michael Burger, Simonswald, DE;

Peter Steurer, Geislingen, DE;

Günter Hirt, Steinach, DE;

Stefan Kienzler, Freiburg, DE;

Assignees:

SICK AG, Waldkirch/Breisgau, DE;

TRUMPF WERKZEUGMASCHINEN SE + CO. KG, Ditzingen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01V 8/20 (2006.01); B23Q 15/007 (2006.01);
U.S. Cl.
CPC ...
G01V 8/20 (2013.01); B23Q 15/007 (2013.01);
Abstract

A sensor apparatus for detecting a target object influenced by a process or formed in the process includes a sensor unit and an evaluation device. The sensor unit detects the target object in a detection zone of the sensor unit and generates a sensor signal that can be influenced by the target object. The evaluation device processes the sensor signal as a first input variable and generates an output signal, which indicates the detection of the target object, in dependence on the sensor signal. The evaluation device further processes a process parameter of the process, which acts on the target object, or a target object parameter, which characterizes the target object and is influenced by the process, as a respective further input variable and to generate the output signal in dependence on the process parameter and/or the target object parameter.


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