The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Jul. 23, 2020
Nantong Textile & Silk Industrial Technology Research Institute, Nantong, CN;
Soochow University, Jiangsu, CN;
NANTONG TEXTILE & SILK INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Nantong, CN;
SOOCHOW UNIVERSITY, Jiangsu, CN;
Abstract
The low-field nuclear magnetic resonance (LF-NMR) is used in the design of a formula of a water-based printing ink and selection of the water-based printing ink or a wetting agent. The water-based printing ink or the wetting agent is quickly selected through the inversion data of an LF-NMR transverse relaxation time (T). By using LF-NMR to detect the distribution of water in the water-based printing ink or wetting agent, the water-based printing ink is quickly detected in real-time and a high-quality water-based printing ink is selected, which contributes to the design and development of water-based printing inks. The state of water in the ink also is adjusted based on the relationship between the distribution state of water in the printing ink and the definition of the printed pattern, thereby ensuring the definition of the printed pattern.