The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2023

Filed:

Sep. 18, 2018
Applicant:

Endress+hauser Se+co. KG, Maulburg, DE;

Inventors:

Carmen Roser, Steinen, DE;

Daniel Müller, Inzlingen, DE;

Florian Palatini, Kleines Wiesental, DE;

Tanja Haag, Schopfheim, DE;

Assignee:

Endress+Hauser SE+Co. KG, Maulburg, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01F 23/284 (2006.01); G01F 23/296 (2022.01);
U.S. Cl.
CPC ...
G01F 23/284 (2013.01); G01F 23/296 (2013.01);
Abstract

The present disclosure includes a method for creating a masking curve for an ultrasonic or radar-based fill level measuring device. A measuring signal is transmitted, a measurement curve is recorded based on the reflected measuring signal, and at least two greatest maxima are ascertained from the measurement curve. The at least two ascertained maxima are normalized with reference to the greatest maximum and one of the normalized maxima is assigned to the fill level, so that the masking curve can be created based on the measurement curve in at least one subrange between the fill level measuring device and the maximum of the fill level value. Because of the normalization of the maxima, the danger of mistake in the assignment can be lessened, so that the assignment and subsequent fill level measurements are reliable.


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