The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Jul. 23, 2018
Applicant:
Mitsubishi Hitachi Power Systems, Ltd., Yokohama, JP;
Inventors:
Yoshikazu Matsumura, Yokohama, JP;
Naoki Abe, Yokohama, JP;
Kenji Sato, Yokohama, JP;
Shinji Akamatsu, Yokohama, JP;
Kenta Taniguchi, Yokohama, JP;
Satoshi Takiguchi, Tokyo, JP;
Assignee:
MITSUBISHI HEAVY INDUSTRIES, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F23R 3/04 (2006.01); F23R 3/16 (2006.01); F23R 3/28 (2006.01); F23R 3/34 (2006.01); F23R 3/10 (2006.01); F23R 3/18 (2006.01);
U.S. Cl.
CPC ...
F23R 3/04 (2013.01); F23R 3/16 (2013.01); F23R 3/286 (2013.01); F05D 2270/082 (2013.01); F23R 3/10 (2013.01); F23R 3/18 (2013.01); F23R 3/343 (2013.01); F23R 2900/03041 (2013.01); F23R 2900/03042 (2013.01);
Abstract
The upstream-side wall portionincludes, in the circumferential direction thereof, a first regionwhere air inletsare formed at a lower density, and a second regionwhich is disposed at a position offset from the first regionin the circumferential direction, and in which the air inletsare formed at a higher density than in the first region