The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2023

Filed:

May. 12, 2020
Applicant:

Carboncompetence Gmbh, Wattens, AT;

Inventors:

Doris Steinmuller-Nethl, Aldrans, AT;

Detlef Steinmuller, Aldrans, AT;

Assignee:

CARBONCOMPETENCE GMBH, Wattens, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/10 (2006.01); C23C 16/455 (2006.01); C23C 16/27 (2006.01); C30B 25/16 (2006.01); C30B 29/04 (2006.01); C23C 16/448 (2006.01); C30B 25/14 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45502 (2013.01); C23C 16/27 (2013.01); C23C 16/448 (2013.01); C23C 16/4488 (2013.01); C23C 16/4557 (2013.01); C23C 16/45578 (2013.01); C30B 25/10 (2013.01); C30B 25/14 (2013.01); C30B 25/165 (2013.01); C30B 29/04 (2013.01);
Abstract

The invention relates to a device () and method for applying a carbon layer, in particular a diamond layer, to a substrate () by means of chemical vapour deposition, comprising a deposition chamber () into which a process gas, in particular molecular hydrogen and/or a mixture of molecular hydrogen and a carbon-containing gas, such as methane can be supplied, wherein a gas inlet and gas activation element () is provided in the form of a hollow body with a flow channel () for the process gas, a wall () surrounding the flow channel (), and an outlet opening () feeding from the flow channel () into the deposition chamber (), and a heating device () is provided for heating the wall () of the gas inlet and gas activation element ().


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