The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Apr. 20, 2021
Applicant:
Plansee SE, Reutte, AT;
Inventors:
Christian Linke, Ehenbichl, AT;
Thomas Scherer, Lechaschau, AT;
Assignee:
Plansee SE, Reutte, AT;
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); B22F 3/10 (2006.01); C22C 1/04 (2023.01); G02F 1/1524 (2019.01); B22F 3/16 (2006.01); B22F 3/17 (2006.01); C22C 19/03 (2006.01); C22C 27/04 (2006.01); C22F 1/10 (2006.01); C22F 1/18 (2006.01); C23C 14/14 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); B22F 3/1028 (2013.01); B22F 3/16 (2013.01); B22F 3/17 (2013.01); C22C 1/045 (2013.01); C22C 1/0433 (2013.01); C22C 19/03 (2013.01); C22C 27/04 (2013.01); C22F 1/10 (2013.01); C22F 1/18 (2013.01); C23C 14/14 (2013.01); G02F 1/1524 (2019.01); H01J 37/3429 (2013.01); B22F 2998/10 (2013.01);
Abstract
A process for producing a W—Ni sputtering target includes providing the sputtering target with 45 to 75 wt % W and a remainder of Ni and common impurities. The sputtering target contains a Ni(W) phase, a W phase and no or less than 10% by area on average of intermetallic phases measured at a target material cross section.