The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2023

Filed:

May. 07, 2021
Applicant:

California Institute of Technology, Pasadena, CA (US);

Inventors:

Nai-Chang Yeh, Pasadena, CA (US);

Chen-Chih Hsu, Pasadena, CA (US);

Jiaqing Wang, Pasadena, CA (US);

Marcus L. Teague, Pasadena, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/12 (2006.01); C01B 32/186 (2017.01); G01R 33/07 (2006.01); H10N 52/01 (2023.01); H10N 52/80 (2023.01); H10N 52/00 (2023.01);
U.S. Cl.
CPC ...
C01B 32/186 (2017.08); G01R 33/072 (2013.01); H10N 52/01 (2023.02); H10N 52/101 (2023.02); H10N 52/80 (2023.02); G01R 33/1284 (2013.01);
Abstract

A strain engineered material including a monolayer graphene sheet comprising an array of wrinkles induced by deformations in the graphene sheet, the deformations formed by a lattice of underlying nanostructures on a substrate. The lattice of nanostructures comprises rows of the nanostructures and each of the wrinkles comprise a ridge aligned on top of a different one of the rows and along an alignment direction defined by the rows. The deformations pattern a strain distribution in the graphene sheet that induces a periodically varying pseudo magnetic field distribution ranging between a positive value and a negative values. The periodically varying pseudo magnetic field distribution has field magnitude minima located parallel to and between the ridges and field magnitude maxima located near to and parallel to each of the ridges and can be designed for various valleytronic and spintronic device applications.


Find Patent Forward Citations

Yeh, Nai-Chang. (2023). Nanoscale strain engineering of graphene devices with tuneable electronic correlation for quantum valleytronics and spintronics (U.S. Patent No. 11746018). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11746018

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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