The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Apr. 20, 2016
The Nippon Synthetic Chemical Industry Co., Ltd., Osaka, JP;
Shintaro Usui, Osaka, JP;
MITSUBISHI CHEMICAL CORPORATION, Tokyo, JP;
Abstract
An object of the present invention is to provide a stand-up pouch for retort which has a high rate of gas barrier property recovery after retort processing and can stably retain high gas barrier properties. The stand-up pouch for retort of the invention comprises a laminate which comprises a base film and, disposed over one surface of the base film, a polyamide resin layer, a saponified ethylene-vinyl ester copolymer layer, and a heat-sealing resin layer, wherein the polyamide resin layer adjoins the saponified ethylene-vinyl ester copolymer layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile