The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11744154 B1

Date of Patent:

Aug. 29, 2023

Filed:

Aug. 01, 2017

Use of an electric field for detaching a piezoelectric layer from a donor substrate

Applicant:

Soitec, Bernin, FR;

Inventor:

Cédric Charles-Alfred, Grenoble, FR;

Assignee:

Soitec, Bernin, FR;

Attorney:

TraskBritt

Primary Examiner:

A Dexter Tugbang

Int. Cl.

CPC ...

H10N 30/072 (2023.01); H10N 30/085 (2023.01); H10N 30/853 (2023.01); H10N 30/04 (2023.01);

U.S. Cl.

CPC ...

H10N 30/085 (2023.02); H10N 30/072 (2023.02); H10N 30/853 (2023.02); H10N 30/8542 (2023.02); H10N 30/8554 (2023.02); H01L 2221/68363 (2013.01); H10N 30/04 (2023.02); Y10T 29/42 (2015.01);

Abstract

A method for transferring a piezoelectric layer from a donor substrate onto a support substrate comprises the steps of: a) providing a predetermined splitting area in a piezoelectric donor substrate, b) attaching the piezoelectric donor substrate to a support substrate to form an assembly, and c) detaching the piezoelectric layer from the piezoelectric donor substrate comprising applying an electric field. By using the electric field, the detachment step can be carried out at low temperatures. A detachment chamber for carrying out at least a portion of such a method includes one or two chucks comprising first and/or second electrodes for applying an electric field to a piezoelectric layer.

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