The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

May. 17, 2021
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventor:

Dejiang Zhao, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/32 (2006.01); H10K 59/122 (2023.01); B41J 3/407 (2006.01); H10K 59/173 (2023.01); H10K 59/35 (2023.01); H10K 71/00 (2023.01); H10K 71/60 (2023.01); H10K 50/11 (2023.01); H10K 50/15 (2023.01); H10K 50/17 (2023.01); H10K 59/12 (2023.01);
U.S. Cl.
CPC ...
H10K 59/122 (2023.02); B41J 3/407 (2013.01); H10K 59/173 (2023.02); H10K 59/353 (2023.02); H10K 71/00 (2023.02); H10K 71/611 (2023.02); H10K 50/11 (2023.02); H10K 50/15 (2023.02); H10K 50/17 (2023.02); H10K 59/1201 (2023.02);
Abstract

A display panel having a pixel defining layer defining subpixel apertures of subpixels is provided. The pixel defining layer is a unitary structure including column portions and row portions. A respective row portion is between two adjacent subpixel apertures that are in a same column and respectively from two adjacent rows. A respective column portion is in a space between two adjacent columns of subpixel apertures, spacing apart multiple pairs of adjacent row portions respectively in multiple rows. A respective row portion includes a depression part configured to allow fluid communication of an ink solution between the two adjacent subpixel apertures in the same column and respectively from the two adjacent rows. A minimum height of the depression part relative to a base substrate is less than a minimum height of a column portion adjacent to the respective row portion relative to the base substrate.


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