The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

Jul. 22, 2022
Applicant:

Adaps Photonics Inc., San Jose, CA (US);

Inventors:

Ching-Ying Lu, San Jose, CA (US);

Yangsen Kang, San Jose, CA (US);

Shuang Li, San Jose, CA (US);

Kai Zang, San Jose, CA (US);

Assignee:

Adaps Photonics Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/10 (2006.01); H01L 31/107 (2006.01); H01L 31/02 (2006.01); H01L 27/146 (2006.01); C30B 25/18 (2006.01); H04N 25/76 (2023.01);
U.S. Cl.
CPC ...
H01L 31/107 (2013.01); C30B 25/18 (2013.01); H01L 27/14636 (2013.01); H01L 31/02027 (2013.01); H04N 25/76 (2023.01);
Abstract

The present invention provides a single photon avalanche diode device. The device has a logic substrate comprising an upper surface. The device has a sensor substrate bonded to an upper surface of the logic substrate. In an example, the sensor substrate comprises a plurality of pixel elements spatially disposed to form an array structure. In an example, each of the pixel elements has a passivation material, an epitaxially grown silicon material, an implanted p-type material configured in a first portion of the epitaxially grown material, an implanted n-type material configured in a second portion of the epitaxially grown material, and a junction region configured from the implanted p-type material and the implanted n-type material.


Find Patent Forward Citations

Loading…