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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11740551 B1

PDFFull Text
Date of Patent:
Aug. 29, 2023

Filed:

Nov. 23, 2018

Method for producing substrate

Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Jun Haeng Lee, Daejeon, KR;

Yeon Keun Lee, Daejeon, KR;

Jung Doo Kim, Daejeon, KR;

Han Min Seo, Daejeon, KR;

Cheol Ock Song, Daejeon, KR;

Nam Seok Bae, Daejeon, KR;

Assignee:

LG Chem, Ltd.;

Attorney:

Lerner David LLP

Primary Examiner:

Martin J Angebranndt

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G02F 1/133 (2006.01); G03F 1/60 (2012.01); G02F 1/00 (2006.01); G02F 1/1339 (2006.01);
U.S. Cl.
CPC ...
G03F 1/60 (2013.01); G02F 1/0063 (2013.01); G02F 1/13392 (2013.01); G03F 7/039 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/2004 (2013.01); G02F 1/13398 (2021.01);
Abstract

The present application relates to a method for producing a substrate which includes a step of exposing and developing a photosensitive resin composition layer formed on a surface of a substrate base layer to produce spacers. The method for producing a substrate of the present application can uniformly form spacers having a height according to a desired cell gap and can also freely control the height of the spacers.

Find Patent Forward Citations

Lee, Jun. (2023). Method for producing substrate (U.S. Patent No. 11740551). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11740551

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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