The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2023
Filed:
Nov. 23, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Jun Haeng Lee, Daejeon, KR;
Yeon Keun Lee, Daejeon, KR;
Jung Doo Kim, Daejeon, KR;
Han Min Seo, Daejeon, KR;
Cheol Ock Song, Daejeon, KR;
Nam Seok Bae, Daejeon, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G02F 1/133 (2006.01); G03F 1/60 (2012.01); G02F 1/00 (2006.01); G02F 1/1339 (2006.01);
U.S. Cl.
CPC ...
G03F 1/60 (2013.01); G02F 1/0063 (2013.01); G02F 1/13392 (2013.01); G03F 7/039 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/2004 (2013.01); G02F 1/13398 (2021.01);
Abstract
The present application relates to a method for producing a substrate which includes a step of exposing and developing a photosensitive resin composition layer formed on a surface of a substrate base layer to produce spacers. The method for producing a substrate of the present application can uniformly form spacers having a height according to a desired cell gap and can also freely control the height of the spacers.