The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

May. 29, 2020
Applicants:

Hiroyuki Suhara, Kanagawa, JP;

Takashi Fujita, Kanagawa, JP;

Atsushi Takeuchi, Kanagawa, JP;

Kohji Sakai, Tokyo, JP;

Asato Tamura, Tokyo, JP;

Shohta Kobashigawa, Tokyo, JP;

Inventors:

Hiroyuki Suhara, Kanagawa, JP;

Takashi Fujita, Kanagawa, JP;

Atsushi Takeuchi, Kanagawa, JP;

Kohji Sakai, Tokyo, JP;

Asato Tamura, Tokyo, JP;

Shohta Kobashigawa, Tokyo, JP;

Assignee:

RICOH COMPANY, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/12 (2006.01); G02F 1/11 (2006.01); G01B 11/24 (2006.01); H01S 3/067 (2006.01);
U.S. Cl.
CPC ...
G02B 26/124 (2013.01); G01B 11/24 (2013.01); G02F 1/11 (2013.01); H01S 3/067 (2013.01);
Abstract

An apparatus configured to fly a light-absorbing material, includes a unit configured to irradiate a light-absorbing material absorbing light with a laser beam corresponding to a light absorption wavelength of the light-absorbing material to fly the light-absorbing material. When a preceding beam radiation region and a following beam radiation region overlap, the following beam radiation region is irradiated with the laser beam such that a beam centroid position is outside the preceding beam radiation region.


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