The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2023
Filed:
Sep. 23, 2021
Zhejiang University, Zhejiang, CN;
ZHEJIANG UNIVERSITY, Hangzhou, CN;
Abstract
The present disclosure relates to an expanding and radiative flow mechanism. The mechanism has a bottom surface. The bottom surface is provided with a fluid supply port. The bottom surface of the mechanism and a surface of a to-be-adsorbed object form a gap during use. A fluid flows out from the fluid supply port, enters the gap and flows out along the gap. The gap is an expanding gap and meets the following: a radial length exists with the fluid supply port as an initial point of the flow, and a height of the gap continuously increases in an outward radial direction within this length. With improvements to a parallel radiative flow mechanism, the mechanism of the present disclosure can effectively increase an absorption force of a radiative flow, which is conducive to subsequent applications thereof.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile