The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

May. 20, 2020
Applicant:

Proventia Oy, Oulunsalo, FI;

Inventors:

Sauli Halonen, Oulunsalo, FI;

Tuomas Tyni, Oulunsalo, FI;

Jukka Kurikka, Oulunsalo, FI;

Juha Karhu, Oulunsalo, FI;

Assignee:

Proventia Oy, Oulunsalo, FI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F01N 3/28 (2006.01); F01N 13/00 (2010.01); B01F 25/313 (2022.01); B01F 25/10 (2022.01); B01F 23/213 (2022.01); B01D 53/94 (2006.01); F01N 3/021 (2006.01); F01N 3/20 (2006.01); B01F 25/00 (2022.01);
U.S. Cl.
CPC ...
F01N 3/2892 (2013.01); B01D 53/9418 (2013.01); B01D 53/9431 (2013.01); B01D 53/9477 (2013.01); B01F 23/2132 (2022.01); B01F 25/102 (2022.01); B01F 25/103 (2022.01); B01F 25/3131 (2022.01); F01N 3/021 (2013.01); F01N 3/2066 (2013.01); F01N 13/009 (2014.06); B01F 2025/913 (2022.01); F01N 2610/02 (2013.01); F01N 2610/1453 (2013.01);
Abstract

A mixer arrangement for aftertreatment of exhaust gas including a housing configured to form a cavity including a center flow channel in which the exhaust gas flows; and at least one side inlet arrangement configured to allow the exhaust gas to enter the center flow channel from the sides thereof and configured to cause an advancing center flow in the center flow channel and a rotating flow around or on the edges of the center flow in the center flow channel; wherein the at least one side inlet arrangement contains at least a pair of side inlet pipes on the side of the center flow channel.


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