The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

Dec. 07, 2018
Applicant:

Saint-gobain Glass France, Courbevoie, FR;

Inventors:

Yohan Faucillon, Courbevoie, FR;

Vojislav Gajic, Courbevoie, FR;

Thierry Kauffmann, Courbevoie, FR;

Etienne Sandre-Chardonnal, Nantes, FR;

Assignee:

SAINT-GOBAIN GLASS FRANCE, Courbevoie, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/54 (2006.01); G05B 17/02 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3492 (2013.01); C23C 14/35 (2013.01); C23C 14/547 (2013.01); G05B 17/02 (2013.01); H01J 37/3464 (2013.01); H01J 2237/24592 (2013.01);
Abstract

An adjustment-determining method includes obtaining a mathematical model relating an operating parameter of the deposition line to a quality function defined from a quality measurement of a stack of thin layers deposited by the deposition line on a transparent substrate; obtaining a value of the quality function from a value of the quality measurement measured at the outlet of the deposition line on a stack of thin layers deposited by the deposition line on a substrate while the deposition line was set so that an operating parameter had a current value; and automatically determining by the mathematical model an adjustment value for the current value of the operating parameter serving to reduce a difference that exists between the value obtained for the quality function and a target value selected for the quality function for the stack of thin layers.


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