The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

Nov. 12, 2019
Applicant:

Soleras Advanced Coatings Bv, Deinze, BE;

Inventors:

Ignacio Caretti Giangaspro, Antwerp, BE;

Wilmert Cyriel Stefaan De Bosscher, Drongen, BE;

David Karel Debruyne, Ghent, BE;

Guy Gobin, Ostend, BE;

Freddy Fack, Mariakerke, BE;

Hubert Eliano, Scheldewindeke, BE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C01G 25/02 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C01G 25/02 (2013.01); C01P 2002/72 (2013.01); C01P 2006/40 (2013.01);
Abstract

A target for sputtering comprises SiZrxOy wherein x is higher than 0.02 but not higher than 5, and y is higher than 0.03 but not higher than 2*(1+x), wherein the target has an XRD pattern with silicon 2-theta peak at 28.29°+/−0.3°, or a tetragonal phase ZrO2 2-theta peak at 30.05°+/−0.3°. The target has a low resistivity, below 1000 ohm·cm, preferably below 100 ohm·cm, more preferably below 10 ohm·cm, even lower than 1 ohm·cm.


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