The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2023
Filed:
Feb. 07, 2018
Applicant:
Zeon Corporation, Tokyo, JP;
Inventor:
Takaaki Sakurai, Tokyo, JP;
Assignee:
ZEON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 79/08 (2006.01); C08F 12/14 (2006.01); C08F 20/14 (2006.01); G03F 7/039 (2006.01); C08F 12/24 (2006.01); C08F 212/14 (2006.01); C08F 12/22 (2006.01); G03F 7/037 (2006.01); C08F 112/14 (2006.01);
U.S. Cl.
CPC ...
C08L 79/08 (2013.01); C08F 12/14 (2013.01); C08F 12/24 (2013.01); C08F 20/14 (2013.01); C08F 212/24 (2020.02); G03F 7/039 (2013.01); C08F 12/22 (2013.01); C08F 112/14 (2013.01); C08F 112/22 (2020.02); C08F 112/24 (2020.02); C08F 212/14 (2013.01); C08F 212/22 (2020.02); G03F 7/037 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01);
Abstract
Disclosed are photosensitive resin compositions capable of forming positive resin films with excellent heat shape retention. The photosensitive resin compositions comprises a polymer having a monomer unit represented by the following general formula (I) and a polyamideimide: where Ris a single chemical bond or a divalent C1-C6 hydrocarbon group which may have a substituent, and Ris a hydrogen or a monovalent C1-C6 hydrocarbon group which may have a substituent.
Sakurai, Takaaki. (2023). Photosensitive resin composition (U.S. Patent No. 11739215). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11739215
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile