The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

Sep. 20, 2021
Applicant:

Us Synthetic Corporation, Orem, UT (US);

Inventors:

Julie Ann Kidd, North Ogden, UT (US);

Heather Marie Schaefer, North Ogden, UT (US);

Chengkun Xu, Orem, UT (US);

Jason K. Wiggins, Draper, UT (US);

Matthew Brown, Provo, UT (US);

Cody Frisby, Payson, UT (US);

Assignee:

US Synthetic Corporation, Orem, UT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 3/06 (2006.01); E21B 10/56 (2006.01); E21B 10/567 (2006.01); B24D 18/00 (2006.01); C01B 32/28 (2017.01);
U.S. Cl.
CPC ...
B01J 3/062 (2013.01); B24D 18/00 (2013.01); B24D 18/0009 (2013.01); B24D 18/0027 (2013.01); C01B 32/28 (2017.08); E21B 10/56 (2013.01); E21B 10/567 (2013.01); B01J 2203/062 (2013.01);
Abstract

In an embodiment, a polycrystalline diamond table includes a plurality of bonded diamond grains and a plurality of interstitial regions defined by the plurality of bonded diamond grains. The polycrystalline diamond table may be at least partially leached such that at least a portion of at least one interstitial constituent has been removed from at least a portion of the plurality of interstitial regions by exposure to a leaching agent. The leaching agent may include a mixture having a ratio of weight % hydrofluoric acid to weight % nitric acid of about 1.0 to about 2.4, and water in a concentration of about 50 weight % to about 85 weight %. Various other materials, articles, and methods are also disclosed.


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