The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

Aug. 31, 2021
Applicant:

Rockit Body Pilates, Llc, Studio City, CA (US);

Inventors:

Judith Aronson, Manhattan Beach, CA (US);

Alan Crawford, Glendale, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A63B 21/02 (2006.01); A63B 21/04 (2006.01); A63B 21/00 (2006.01); A63B 22/00 (2006.01); A63B 23/035 (2006.01);
U.S. Cl.
CPC ...
A63B 21/025 (2013.01); A63B 21/00065 (2013.01); A63B 21/0407 (2013.01); A63B 21/4034 (2015.10); A63B 21/4035 (2015.10); A63B 21/4045 (2015.10); A63B 22/0056 (2013.01); A63B 22/0089 (2013.01); A63B 21/4033 (2015.10); A63B 21/4039 (2015.10); A63B 21/4043 (2015.10); A63B 23/03516 (2013.01); A63B 2022/0033 (2013.01); A63B 2022/0038 (2013.01);
Abstract

In one aspect of the present exercise machine, an assembly is attached to the end of a reformer, where the assembly comprises a seat mechanism and a pedal mechanism. The seat mechanism has a seat, a bracket supporting the seat, and a height adjustment system, where activation of the height adjustment system permits selective adjustment and locking of the height of the seat and the bracket by restricting travel of the seat and bracket to a slanted path that is slanted relative to the vertical. The pedal mechanism has an axle, a first pedal arm with a first pedal, and a second pedal arm with a second pedal. The pedal mechanism is located directly beneath the seat when the seat mechanism is in a lowest position and partially exposed in a higher position.


Find Patent Forward Citations

Loading…