The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Jan. 24, 2020
Applicant:

The Regents of the University of California, Oakland, CA (US);

Inventors:

Christian J. Zollner, Goleta, CA (US);

Michael Iza, Goleta, CA (US);

James S. Speck, Santa Barbara, CA (US);

Shuji Nakamura, Santa Barbara, CA (US);

Steven P. DenBaars, Goleta, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 29/20 (2006.01); H01L 29/201 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02664 (2013.01); H01L 21/0254 (2013.01); H01L 21/02617 (2013.01); H01L 29/201 (2013.01); H01L 29/2003 (2013.01);
Abstract

A method for protecting a semiconductor film comprised of one or more layers during processing. The method includes placing a surface of the semiconductor film in direct contact with a surface of a protective covering, such as a separate substrate piece, that forms an airtight or hermetic seal with the surface of the semiconductor film, so as to reduce material degradation and evaporation in the semiconductor film. The method includes processing the semiconductor film under some conditions, such as a thermal annealing and/or controlled ambient, which might cause the semiconductor film's evaporation or degradation without the protective covering.


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Zollner, Christian. (2023). Method for processing of semiconductor films with reduced evaporation and degradation (U.S. Patent No. 11735419). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11735419

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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