The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2023
Filed:
Mar. 05, 2019
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Oki Gunawan, Westwood, NJ (US);
Wang Zhou, White Plains, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 7/02 (2006.01); H01L 31/02 (2006.01); G01N 27/72 (2006.01); H10K 39/30 (2023.01);
U.S. Cl.
CPC ...
H01F 7/0273 (2013.01); G01N 27/72 (2013.01); H01L 31/02024 (2013.01); H10K 39/30 (2023.02);
Abstract
Techniques regarding operating one or more parallel dipole line traps are provided. For example, one or more embodiments described herein can comprise a system, which can comprise a parallel dipole line trap comprising a diamagnetic object positioned between a plurality of dipole line magnets. The system can also comprise a split photodetector sensor positioned adjacent to the parallel dipole line trap. The split photodetector sensor can detect a displacement of the diamagnetic object.