The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Oct. 29, 2020
Applicant:

Meta Platforms Technologies, Llc, Menlo Park, CA (US);

Inventors:

Yun-Han Lee, Redmond, WA (US);

Junren Wang, Mercer Island, WA (US);

Mengfei Wang, Seattle, WA (US);

Babak Amirsolaimani, Redmond, WA (US);

Lu Lu, Kirkland, WA (US);

Scott Charles McEldowney, Redmond, WA (US);

Assignee:

META PLATFORMS TECHNOLOGIES, LLC, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G02B 27/01 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3083 (2013.01); G02B 5/3016 (2013.01); G02B 6/005 (2013.01); G02B 27/0172 (2013.01);
Abstract

An optical element includes a first birefringent medium layer with orientations of directors of first optically anisotropic molecules spatially varying with a first in-plane pitch and a first vertical pitch. The optical element also includes a second birefringent medium layer with orientations of directors of second optically anisotropic molecules spatially varying with a second in-plane pitch and a second vertical pitch. The second birefringent medium layer is optically coupled with the first birefringent medium layer and configured to reduce a diffraction of a light by the first birefringent medium layer. The first in-plane pitch is substantially the same as the second in-plane pitch, and the second vertical pitch is smaller than the first vertical pitch.


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