The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Oct. 02, 2019
Applicant:

Palo Alto Research Center Incorporated, Palo Alto, CA (US);

Inventors:

Michael Benedict, Palo Alto, CA (US);

David Mathew Johnson, San Francisco, CA (US);

Elif Karatay, Mountain View, CA (US);

Eric Weflen, Ames, IA (US);

Ravi Neelakantan, Redwood City, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 13/04 (2006.01);
U.S. Cl.
CPC ...
C25D 13/04 (2013.01);
Abstract

A system to electrohydrodynamically pattern a material includes a first electrode having a first voltage, a second electrode having a second voltage that is different from the first voltage, one or more materials to be patterned residing between the first electrode and the second electrode, a gap between at least one surface of at least one of the materials to be patterned and one of the first or second electrodes, at least one patterning material in the gap, wherein the patterning material is a material other than air, and at least one filling material filling any remainder of the gap.


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