The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2023
Filed:
Feb. 04, 2020
Xerox Corporation, Norwalk, CT (US);
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Yunda Wang, Milpitas, CA (US);
Sourobh Raychaudhuri, Mountain View, CA (US);
JengPing Lu, Fremont, CA (US);
Eugene M. Chow, Palo Alto, CA (US);
Julie A. Bert, East Palo Alto, CA (US);
David Biegelsen, Portola Valley, CA (US);
George A. Gibson, Fairport, NY (US);
Jamie Kalb, Mountain View, CA (US);
Xerox Corporation, Norwalk, CT (US);
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Abstract
Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.