The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Mar. 20, 2019
Applicant:

Jfe Steel Corporation, Tokyo, JP;

Inventors:

Takumi Umada, Tokyo, JP;

Yukihiro Shingaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/54 (2006.01); C23C 14/32 (2006.01); C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/542 (2013.01); C23C 14/32 (2013.01); C23C 14/56 (2013.01);
Abstract

Provided is a surface treatment facility in which both surfaces of a material are subjected to continuous film deposition by PVD as the material is conveyed in the longitudinal direction, wherein flutter of the material subjected to coating can be suppressed. This surface treatment facility comprises a chamber configured to continuously deposit a film by PVD on both surfaces of a material as the material is conveyed in the longitudinal direction through the chamber; a conveyance mechanism for conveying the material subjected to coating; a blowing mechanism for blowing film-forming gas in the longitudinal direction on both sides of the material present in the chamber; and has an X/Y ratio within a range of 0.4 to 3.0 where X is the film-forming gas blowing speed, and Y is the conveyance speed of the material subjected to coating, and where the unit of measurement of X and Y is m/min.


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