The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

May. 27, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Stefan Bangert, Steinau, DE;

Andreas Lopp, Freigericht, DE;

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); C23C 14/16 (2006.01); C23C 14/54 (2006.01); C23C 14/04 (2006.01); B05B 12/16 (2018.01); B05C 21/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/24 (2013.01); B05B 12/16 (2018.02); B05C 21/005 (2013.01); C23C 14/042 (2013.01); C23C 14/16 (2013.01); C23C 14/54 (2013.01); H01J 37/32752 (2013.01);
Abstract

A vapor deposition apparatus is described. The vapor deposition apparatus includes a substrate support for supporting a substrate to be coated; a vapor source with a plurality of nozzles for directing vapor toward the substrate support through a vapor propagation volume; and a heatable shield extending from the vapor source toward the substrate support. The heatable shield surrounds the vapor propagation volume at least partially and includes an edge exclusion portion for masking areas of the substrate not to be coated. The substrate support may be a rotatable drum with a curved drum surface, and the vapor deposition apparatus may be configured to move the substrate on the curved drum surface past the vapor source in a circumferential direction.


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