The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Apr. 08, 2020
Applicant:

Tcl China Star Optoelectronics Technology Co., Ltd., Shenzhen, CN;

Inventors:

Lin Al, Shenzhen, CN;

Hsiaohsien Chen, Shenzhen, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09B 69/10 (2006.01); C09B 47/08 (2006.01); C09B 47/18 (2006.01); G02B 1/04 (2006.01);
U.S. Cl.
CPC ...
C09B 69/108 (2013.01); C09B 47/085 (2013.01); C09B 47/18 (2013.01); G02B 1/04 (2013.01); G02F 2202/04 (2013.01); G02F 2203/01 (2013.01);
Abstract

The present application discloses a color resist material, a filter, and a preparation method thereof. The color resist material is a trimer structure formed by polymerizing phthalocyanine dyes, wherein groups with double bonds are introduced on the phthalocyanine dyes to construct a three-molecule complex by a complexing agent, and the phthalocyanine dyes are connected by the double bonds to form a trimer structure. The color resist material with the trimer structure is stably stored in a photoresist liquid and has excellent solvent resistance, while maintains good solubility. Accordingly, a filter made of the color resist material has high transmittance and good optical performance.


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