The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2023
Filed:
Oct. 08, 2021
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Mi Sook Lee, Daejeon, KR;
Se Jin Ku, Daejeon, KR;
No Jin Park, Daejeon, KR;
Jung Keun Kim, Daejeon, KR;
Je Gwon Lee, Daejeon, KR;
Hyung Ju Ryu, Daejeon, KR;
Eun Young Choi, Daejeon, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 5/18 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); C09D 153/00 (2006.01); C08F 293/00 (2006.01); B81C 1/00 (2006.01); G03F 7/40 (2006.01); C09D 133/14 (2006.01);
U.S. Cl.
CPC ...
C08J 5/18 (2013.01); C09D 153/00 (2013.01); G03F 7/16 (2013.01); G03F 7/2016 (2013.01); G03F 7/2037 (2013.01); G03F 7/40 (2013.01); B81C 1/00031 (2013.01); C08F 293/005 (2013.01); C08F 2438/03 (2013.01); C08J 2333/14 (2013.01); C09D 133/14 (2013.01);
Abstract
The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.