The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Dec. 19, 2017
Applicant:

Solvay Specialty Polymers Usa, Llc, Alpharetta, GA (US);

Inventor:

Chantal Louis, Alpharetta, GA (US);

Assignee:

SOLVAY SPECIALTY POLYMERS USA, LLC, Alpharetta, GA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 65/40 (2006.01);
U.S. Cl.
CPC ...
C08G 65/4093 (2013.01); C08G 65/4012 (2013.01); C08G 2650/04 (2013.01); C08G 2650/40 (2013.01);
Abstract

Described herein are PEKK polymers having improved processability and improved crystallinity. It was surprisingly found that PEKK polymers formed using a specifically adapted nucleophilic synthesis route, in which different monomers are added in to the polymerization reaction at different points during the synthesis, had lower glass transition temperatures ('Tg') and increased crystallinities, relative to PEKK polymers formed using traditional nucleophilic synthesis routes ('traditional PEKK polymers'). Furthermore, compared with PEKK polymers synthesized using an electrophilic synthesis routes, the PEKK polymers described herein and significantly lower halogen content. The synthesis routes includes a first heating of a first monomer blend in a reaction mixture, a subsequent first addition of a second monomer blend to the reaction mixture, and a second heating of the reaction mixture subsequent to the first addition.


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