The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Aug. 05, 2021
Applicant:

California Institute of Technology, Pasadena, CA (US);

Inventors:

Samad A. Firdosy, Pasadena, CA (US);

Robert P. Dillon, Long Beach, CA (US);

Nicholas E. Ury, Pasadena, CA (US);

Katherine Dang, Pasadena, CA (US);

Joshua Berman, Pasadena, CA (US);

Pablo Narvaez, Pasadena, CA (US);

Vilupanur A. Ravi, Claremont, CA (US);

John Paul Castelo Borgonia, Monrovia, CA (US);

Joelle T. Cooperrider, Pasadena, CA (US);

Bryan W. McEnerney, Pasadena, CA (US);

Andrew A. Shapiro-Scharlotta, Glendale, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 7/02 (2006.01); B22F 10/28 (2021.01); B22F 3/15 (2006.01); B22F 10/64 (2021.01); B33Y 10/00 (2015.01); B33Y 80/00 (2015.01); H05K 9/00 (2006.01); B33Y 40/20 (2020.01);
U.S. Cl.
CPC ...
B22F 7/02 (2013.01); B22F 3/15 (2013.01); B22F 10/28 (2021.01); B22F 10/64 (2021.01); B33Y 10/00 (2014.12); B33Y 40/20 (2020.01); B33Y 80/00 (2014.12); H05K 9/0081 (2013.01); B22F 2301/35 (2013.01); B22F 2304/10 (2013.01); Y10T 29/49002 (2015.01);
Abstract

Systems and methods of additively manufacturing multi-material electromagnetic shields are described. Additive manufacturing processes use co-deposition to incorporate multiple materials and/or microstructures selected to achieve specified shield magnetic properties. Geometrically complex shields can be manufactured with alternating shielding materials optimized for the end use application. The microstructures of the printed shields can be tuned by optimizing the print parameters.


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