The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Dec. 04, 2020
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sun Hye Lee, Yongin-si, KR;

Sung Soo Kim, Hwaseong-si, KR;

Ik Soo Kim, Yongin-si, KR;

Woong Sik Nam, Seoul, KR;

Dong Hyun Roh, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/10 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
H01L 29/6656 (2013.01); H01L 29/0673 (2013.01); H01L 29/1033 (2013.01); H01L 29/1079 (2013.01); H01L 29/66545 (2013.01); H01L 29/66553 (2013.01); B82Y 10/00 (2013.01);
Abstract

A semiconductor device includes first and second active patterns each extending in a first direction and are spaced apart from each other in a second direction that is perpendicular to the first direction. A field insulating layer is disposed between the first active pattern and the second active pattern. A first gate structure is disposed on the first active pattern and extends in the second direction. An interlayer insulating layer is disposed between the first gate structure and the field insulating layer. The interlayer insulating layer includes a first part disposed below the first gate structure. A spacer is disposed between the first gate structure and the first part of the interlayer insulating layer.


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